▎ 摘 要
NOVELTY - Light-resistant graphene ultraviolet ink comprises 25-55% polyurethane acrylic resin, 3-6% photocatalytic modified graphene, 2.5-4% pigment, 0.5-5% photoinitiator, 0.8-1.8% dispersant, 0.02-0.5% auxiliary agent, 6-25% filler, and solvent (specific amount). USE - Used as light-resistant graphene ultraviolet ink. ADVANTAGE - The ink is prepared by high temperature and high-pressure reaction kettle, and storing under the dark condition. The method is simple, has high yield, long product period; and is suitable for industrial production. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing the light-resistant graphene ultraviolet ink, comprising (i) dissolving bismuth (III) nitratein aqueous nitric acid, heating, stirring at 85degreesC for 10-20 minutes to clarify, adding a certain concentration of ethylenediaminetetraacetic acid (EDTA), At the same time, dissolving ammonium metavanadate in deionized water, heating and stirring at 45degreesC for 10-20 minutes, mixing the above two solutions under constant stirring, and adjusting to required pH to obtain bismuth vanadate precursor solution; (ii) adding graphene oxide into bismuth vanadate precursor solution, placing in a high-temperature and high-pressure reaction kettle containing a polytetrafluoroethylene liner, using a hydrothermal method, under high-temperature and high-pressure conditions to obtain photocatalytically modified graphene; (iii) dissolving the photocatalytically modified graphene and urethane acrylic resin in alcohol solvent in a light-proof condition, adding a certain proportion of pigments, dispersants and other raw materials, stirring at a low speed, and dispersing treatment under ultrasonic conditions, and adjusting the pH to obtain photocatalytic graphene UV ink, which is stored in the dark; (iv) adding the prepared photocatalytic graphene UV ink to ink tank, filtering, and poly(vinyl chloride) film is unrolled-gravure printing (coating)-bellows drying-UV curing-coating protective layer-bellows drying-winding.