▎ 摘　　要

NOVELTY - Preparing silicene-coated graphene involves putting the silicon powder raw material in the feeding system, melting from the feeding system at 800-1500degrees Celsius to form molten droplets, and cooling the molten droplets into nano-scale silicon crystals during the falling process. The nano-scale silicon crystals are placed in industrial pure water, and stirred uniformly to obtain suspension (A). The nanoscale graphene is obtained and placed in industrial pure water, stirred to obtain suspension (B). The suspension (A) is coated on the flat substrate by high-precision rapid printing equipment, and the flat substrate is heated for the first time, and formed a nano-scale silicon crystal layer on the flat substrate. The high-precision rapid spraying equipment used to spray the suspension (B) on the nano-scale silicon crystal layer. The flat substrate is heated for the second time to form a nanoscale graphene layer on the nanoscale silicon crystal layer. USE - Method for preparing silicene-coated graphene ADVANTAGE - The method can save expensive vapor deposition equipment and manufacturing procedures for slow production equipment. DETAILED DESCRIPTION - Preparing silicene-coated graphene involves putting the silicon powder raw material in the feeding system, melting from the feeding system at 800-1500degrees Celsius to form molten droplets, and cooling the molten droplets into nano-scale silicon crystals during the falling process. The nano-scale silicon crystals are placed in industrial pure water, and stirred uniformly to obtain suspension (A). The nanoscale graphene is obtained and placed in industrial pure water, stirred to obtain suspension (B). The suspension (A) is coated on the flat substrate by high-precision rapid printing equipment, and the flat substrate is heated for the first time, and formed a nano-scale silicon crystal layer on the flat substrate. The high-precision rapid spraying equipment used to spray the suspension (B) on the nano-scale silicon crystal layer. The flat substrate is heated for the second time to form a nanoscale graphene layer on the nanoscale silicon crystal layer. The carbon dioxide gas is poured into the flat substrate and sequentially covered with the nano-scale silicon crystal layer and the nano-scale graphene layer to obtain a composite crystal film after drying for 30-60 minutes. The composite crystal film is placed in a (-5)-(0)degrees Celsius. environment for 20-30 minutes to obtain the silicene-coated graphene solid.