• 专利标题:   Preparation method of self-supporting reduced graphene oxide film, involves coating oxidized graphene dispersion droplets on substrate having micro-nanostructure structure to produce oxide graphene film on substrate, and naturally drying.
  • 专利号:   CN107032328-A
  • 发明人:   HE J, CAO Y, YANG H, SUN J
  • 专利权人:   TECH INST PHYSICS CHEM CHINESE ACAD
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN107032328-A 11 Aug 2017 C01B-032/184 201769 Pages: 13 Chinese
  • 申请详细信息:   CN107032328-A CN10073189 02 Feb 2016
  • 优先权号:   CN10073189

▎ 摘  要

NOVELTY - Preparation method of self-supporting reduced graphene oxide film, involves (i) dispersing oxidized graphene in ethanol to prepare oxidized graphene dispersion, (ii) coating oxidized graphene dispersion droplets on substrate having micro-nanostructure structure to produce oxide graphene film on substrate having micro-nano-structured structure, (iii) naturally drying oxidized graphene film spread on substrate having micro- nanostructure in air, placing in a mixed atmosphere of argon and hydrogen, maintaining air pressure to 50-500 Pa and performing heat treatment. USE - Preparation method of self-supporting reduced graphene oxide film (claimed). ADVANTAGE - The self-supporting reduced graphene oxide film has excellent conductivity and is conducive to carrier migration. The degree of reduction of graphene oxide in the film can be easily controlled by the temperature of the heat treatment according to the practical application. DETAILED DESCRIPTION - Preparation method of self-supporting reduced graphene oxide film, involves (i) dispersing oxidized graphene in ethanol to prepare oxidized graphene dispersion having a mass concentration of 0.2-1.0 mg/mL, (ii) coating oxidized graphene dispersion droplets on a substrate having a micro-nanostructure structure to produce oxide graphene film on a substrate having micro-nano-structured structure, (iii) naturally drying oxidized graphene film spread on substrate having micro- nanostructure in air, placing in a mixed atmosphere of argon and hydrogen, maintaining air pressure to 50-500 Pa, performing heat treatment at 200-1000 degrees C for 2-5 hours, obtaining substrate having micro-nano-structured structure with same area and same shape, and detaching self-supporting reduced graphene oxide film completely from substrate. An INDEPENDENT CLAIM is included for self-supporting reduced graphene oxide film which is prepared by the preparation method of self-supporting reduced graphene oxide film.