• 专利标题:   Growing high-entropy alloy nanoparticles on a flexible substrate involves obtaining a flexible substrate, using laser direct writing technology to grow a three-dimensional graphene film with a preset shape on the flexible substrate.
  • 专利号:   CN112935274-A, CN112935274-B
  • 发明人:   LI M, LI X, XU P, WANG X
  • 专利权人:   SHANGHAI INST MICROSYSTEM INFORMATION
  • 国际专利分类:   B22F001/00, B22F009/30, B82Y030/00, B82Y040/00, C01B032/184, C22C030/00, C22C030/02, C23C018/14, B22F001/054
  • 专利详细信息:   CN112935274-A 11 Jun 2021 B22F-009/30 202168 Pages: 8 Chinese
  • 申请详细信息:   CN112935274-A CN10112853 27 Jan 2021
  • 优先权号:   CN10112853

▎ 摘  要

NOVELTY - Growing high-entropy alloy nanoparticles on a flexible substrate involves obtaining a flexible substrate; using laser direct writing technology to grow a three-dimensional graphene film with a preset shape on the flexible substrate; obtaining a precursor solution of pre-synthesized high-entropy alloy nanoparticles; dropping the precursor solution onto the three-dimensional graphene film to form a pretreatment sample. The laser direct writing technology is used to perform radiation heating treatment on the three-dimensional graphene film on the pretreated sample to obtain the high-entropy alloy nanoparticles. USE - Method for growing high-entropy alloy nanoparticles on a flexible substrate. ADVANTAGE - The method enables to grow high-entropy alloy nanoparticles on a flexible substrate, where uniformity of the nano-particle size of the high-entropy alloy and the total loading of the alloy can be effectively improved, effectively avoids high temperature thermal damage to the flexible substrate, pulsed laser pyrolysis growth mechanism is also conducive to obtaining high-entropy alloy nanoparticles with a single phase.