• 专利标题:   Synthesizing graphene pattern by physically adhering catalyst block including catalyst material to portion of growth substrate, and forming graphene thin film selectively at interface between catalyst block and growth substrate.
  • 专利号:   US2020149152-A1, KR2020054655-A, KR2149831-B1, US10815565-B2
  • 发明人:   PARK J, SIM Y, KIM J, SIM Y M, PARKJAEHYUN
  • 专利权人:   KOREA INST SCI TECHNOLOGY, KOREA INST SCI TECHNOLOGY
  • 国际专利分类:   C23C016/02, C23C016/26, G02F001/00, G02F001/01, B01J021/04, C01B032/184
  • 专利详细信息:   US2020149152-A1 14 May 2020 C23C-016/02 202046 Pages: 18 English
  • 申请详细信息:   US2020149152-A1 US198663 21 Nov 2018
  • 优先权号:   KR138211

▎ 摘  要

NOVELTY - Method for synthesizing a graphene pattern, involves physically adhering a catalyst block including a catalyst material to a portion of a growth substrate to form an interface between the catalyst block and the growth substrate, and forming a graphene thin film selectively at the interface between the catalyst block and the growth substrate in an atmosphere including a carbon source and a growth inhibitor. USE - The method is used for synthesizing a graphene pattern, which is used for manufacturing an electro-optical modulator (claimed). ADVANTAGE - The method forms the graphene pattern directly without an individual patterning process, thus improving the efficiency and reliability of manufacturing the electro-optical modulator. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for manufacturing an electro-optical modulator.