▎ 摘　　要

NOVELTY - The production method of graphene oxide involves preparing monolayer of graphene on copper foil surface, placing long single-layer graphene on a silicon foil liner by reactive ion etching technique, adjusting the power to 10-50 W, maintaining under helium atmosphere, passing 5-10 sccm flow of oxygen, allowing the oxygen plasma produced to react with single-layer of graphene for 2-5 minutes, taking out sample, maintaining at 20-25 degrees C and 30-60% relative humidity for 3-5 hours. USE - The method is useful for producing graphene oxide, which is used in high-precision humidity sensor, high precision DNA sequencing, large capacity lithium-ion battery and super capacitor. ADVANTAGE - The thickness of the oxidized graphene sheets is reduced and the size of graphene oxide is reached to the wafer size.