▎ 摘　　要

NOVELTY - Evaluating (M1) graphene synthesis processes involves providing a substrate having site isolated regions defined on it; depositing a metal layer within each region of the site isolated regions, where the metal layer deposited in a combinatorial manner among the site isolated regions; synthesizing a graphene layer over each metal layer within each region of the site isolated regions; and evaluating grain boundary profiles in the synthesized graphene layer over each metal layer within each region of the site isolated regions. USE - For evaluating graphene synthesis processes (claimed). ADVANTAGE - The method provides rapid combinatorial processing techniques which increase productivity in research and development of new materials, chemistries, and processing of semiconductor substrates and associated devices. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for combinatorially (M2) processing graphene, involving providing a substrate having site isolated regions defined on it; depositing a metal layer within each region of the site isolated regions, where a composition of at least one metal layer varies from remaining metal layers in a combinatorial manner; forming a graphene layer over each metal layer within each region of the site isolated regions; and evaluating morphological properties in the synthesized graphene layer over each metal layer within each region of the site isolated regions. DESCRIPTION OF DRAWING(S) - The figure shows view of diagram of High-Productivity Combinatorial (HPC) screening process for use in evaluating materials.