• 专利标题:   Transistor i.e. FET, has leakage electrode that is in contact with semiconductor lining substrate, and source electrode that is in contact with uppermost graphene layer of overlapped layer.
  • 专利号:   CN102157548-A
  • 发明人:   WANG P, ZHANG W, LIN X, SUN Q
  • 专利权人:   UNIV FUDAN
  • 国际专利分类:   H01L029/16, H01L029/78
  • 专利详细信息:   CN102157548-A 17 Aug 2011 H01L-029/16 201164 Pages: 7 Chinese
  • 申请详细信息:   CN102157548-A CN10037951 15 Feb 2011
  • 优先权号:   CN10037951

▎ 摘  要

NOVELTY - The transistor has an overlapped layer arranged on a semiconductor lining substrate and constituted by graphene and an insulating medium overlapped with each other. A grid electrode is formed by coating parts of the overlapped layer. An insulating layer is arranged between the grid electrode and the overlapped layer. A source electrode and a leakage electrode are arranged on two sides of the grid electrode. The leakage electrode is in contact with the semiconductor lining substrate. The source electrode is in contact with an uppermost graphene layer of the overlapped layer. USE - Transistor i.e. FET. ADVANTAGE - The transistor is small in size. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a transistor.