▎ 摘　　要

NOVELTY - The method involves forming (S20) first metal mask pattern on a substrate on which a graphene layer is formed. A graphene pattern is formed (S10) by performing (S30) an etching process on the graphene layer using the first metal mask pattern as an etching mask. The formation of the first metal mask pattern involves forming a first adhesive layer on the graphene layer. The first metal mask pattern prepared in advance is placed on the first adhesive layer. The first adhesive layer is heated to attach the first metal mask pattern on the substrate. USE - Method for fabricating graphene nano device. ADVANTAGE - A graphene nano device having improved electrical properties is provided. The contamination of the surface of the graphene pattern is decreased and thus more accurate micro graphene pattern is formed, by performing a patterning process using a membrane mask pattern formed by using a nitride layer. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a method of fabricating a graphene nano device. Step for forming graphene layer on substrate (S10) Step for forming metal mask pattern on the substrate (S20) Step for performing etching process (S30) Step for forming membrane mask pattern on substrate (S40) Step for performing etching process (S50)