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  • 专利标题:   Preparing graphene on substrate involves cleaning substrate, polishing cleaned substrate, and plating metal catalyst film on substrate, where catalyst is coated with metal film of substrate placed in reaction chamber.
  • 专利号:   CN103981507-A, CN103981507-B
  • 发明人:   CHEN Z, XIE Z, CENG Y
  • 专利权人:   UNIV CHINA ELECTRONIC SCI TECHNOLOGY
  • 国际专利分类:   C23C016/01, C23C016/26
  • 专利详细信息:   CN103981507-A 13 Aug 2014 C23C-016/26 201471 Pages: 11 Chinese
  • 申请详细信息:   CN103981507-A CN10214108 21 May 2014
  • 优先权号:   CN10214108

▎ 摘　　要

NOVELTY - Preparing graphene on a substrate involves cleaning the substrate, polishing the cleaned substrate, and plating metal catalyst film on the substrate, where the catalyst is coated with a metal film of the substrate placed in a reaction chamber. The chemical vapor deposition apparatus is provided to start generating a plasma ball, and heats the substrate. The substrate is heated to 500-900 degrees C. USE - Method for preparing graphene on a substrate (claimed).