▎ 摘　　要

NOVELTY - The method involves controlling oxygen excitons to move in direction of magnetic field (4) toward a graphene film for enhancing directionality of etching the graphene film in perpendicular direction and increasing quality of a graphene film microstructure pattern. Directionality of movement of the oxygen excitons is controlled and shape to be etched on a graphene film graphic structure is regulated for regulating the graphene film microstructure pattern by adjusting strength and the direction of the magnetic field. USE - Method for utilizing UV oxidation for implementing and regulating a graphene film pattern. ADVANTAGE - The method enables implementing and regulating a micrometer graphic structure array for large-area graphene film patterning, thus providing high quality to the patterned graphene film. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a structure for utilizing UV oxidation for implementing and regulating a graphene film pattern. Lamp excimer discharge tube (2) Magnetic field generating device (3) Magnetic field (4) Ozone molecule (5) Graphene film hard mask (6)