▎ 摘　　要

NOVELTY - Graphene iron (II,III) oxide solid phase microextraction probe comprises iron (II,III) oxide nanowire arrays and graphene nanocrystals sequentially deposited on the surface of the metal wire, where the base of the probe is a metal wire. USE - Used as a graphene iron (II,III) oxide solid phase microextraction probe. ADVANTAGE - The method has simple process. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing graphene- iron (II,III) oxide solid phase microextraction probe comprising (a) cleaning and drying the metal wire, hot-dipping aluminum on the surface of the metal wire, where thickness of aluminum plating layer is 5-50 mu m, anodizing aluminum plating layer, forming nano-scale pores on the aluminized layer, cleaning and drying, (b) mixing Iron(III) chloride, sodium citrate, sodium acetate and ethylene glycol, stirring to dissolve and ultrasonically dispersing uniformly to obtain sol, where mass ratio of Iron(III) chloride, sodium citrate, and sodium acetate is 2:1:4 and volumetric dosage of ethylene glycol is 30-50 ml/g based on mass of Iron(III) chloride, (c) applying sol of the step (b) to surface of the metal wire prepared in step (a), applying ultrasonic vibration for 10-30 minutes to promote the sol to penetrate into the nano-scale pores, immersing in the sol of the step (b), heating to 200 degrees C for 5-10 hours, cooling and placing in a 1 mol/l sodium hydroxide solution, soaking for 30-60 minutes, dissolving anodized aluminum and unoxidized aluminum layer on the surface to obtain metal wire with iron (II,III) oxide nanowire array grown on the surface, (d) placing metal wire with iron (II,III) oxide nanowire array grown on the surface in the electron cyclotron plasma sputtering deposition chamber, evacuating to 1x 10-4Pa, blowing in argon gas, maintaining air pressure at 1x 10-2 Pa, applying coil magnetic field and introduce microwaves, generating argon plasma under coupling action of magnetic field and microwave, applying target bias voltage of 200V to bombard carbon target, applying bias voltage of -100 V to substrate, sputter depositing for 5-20 minutes and depositing graphene nanocrystals on the surface of the iron (II,III) oxide nanowire array.