▎ 摘　　要

NOVELTY - The method involves forming a graphene layer (320) on a catalyst layer through chemical vapor deposition. An oxide layer (330) is formed on a defect site of the graphene layer. A graphene nano-mesh including a set of openings is formed by etching the oxide layer. The graphene nano-mesh is transferred onto a substrate after removing the catalyst layer. A cover film is formed on the graphene nano-mesh after forming the graphene nano-mesh including the set of openings, where the chemical vapor deposition includes plasma enhanced chemical vapor deposition. USE - Method for fabricating a graphene nano-mesh in a transparent display device, an organic light-emitting device, and a solar battery. ADVANTAGE - The method enables improving electric characteristics of the graphene nano-mesh. The method enables reducing fabricating processes and time by avoiding an additional photolithography process. DETAILED DESCRIPTION - The substrate is a flexible transparent substrate. An INDEPENDENT CLAIM is also included for a method for fabricating an ultra-capacitor. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of an ultra-capacitor. Graphene layer (320) Oxide layer (330)