• 专利标题:   Surface coupling inducing ionization technology feeding first beam of electromagnetic wave to material through free space or waveguide, and exciting surface plasma wave at same time and introducing target molecules to surface of material.
  • 专利号:   WO2021226741-A1, EP4149214-A1, US2023171870-A1, JP2023524179-W
  • 发明人:   ZHANG L, YAN X
  • 专利权人:   ZHANG L, HIGHDIMENSIONAL PLASMA SOURCES TECHNOLO, HIGH DIMENSIONAL PLASMA SOURCES TECHNOLOGY XIAOGAN CO LTD
  • 国际专利分类:   H05H001/24, H05H001/46, H05H001/26
  • 专利详细信息:   WO2021226741-A1 18 Nov 2021 H05H-001/24 202102 Pages: 45 Chinese
  • 申请详细信息:   WO2021226741-A1 WOCN089346 09 May 2020
  • 优先权号:   EP935349, JP512256, WOCN089346, US17921723

▎ 摘  要

NOVELTY - Surface coupling inducing ionization technology involves feeding first electromagnetic wave into material through a free space or a waveguide, such that the first electromagnetic wave resonates with the surface plasmon of the material and exciting surface plasmon wave is generated. Target molecules to be ionized are introduced to the surface of the material. Electrons of the target molecules are coupled with the surface plasmons on the material by controlling interaction between the surface of the material and the target molecules. The target molecules are induced to ionize through free space or waveguide. Second electromagnetic waves are feed into an ionization area of the target molecule on the surface of the material, such that ionized target molecule is absorbed and ionization degree of the target molecule is improved. The target molecules are released in the form of bulk plasma to achieve surface coupling, and induced ionization. USE - Method for surface coupling inducing ionization technology. ADVANTAGE - The method has higher energy feeding efficiency, high energy density, and wide range of electron temperature and ion temperature, and provides reliable prerequisite for broadening the application of plasma. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a type of plasma device whose plasma source, which comprises plasma sources.