• 专利标题:   Preparing graphene nanoribbon array, by introducing carbon source gas on surface of liquid metal/wetting substrate to perform chemical vapor deposition in hydrogen and argon atmosphere.
  • 专利号:   CN111620325-A
  • 发明人:   YU G, CAI L
  • 专利权人:   CHINESE ACAD SCI CHEM INST
  • 国际专利分类:   C01B032/186
  • 专利详细信息:   CN111620325-A 04 Sep 2020 C01B-032/186 202080 Pages: 15 Chinese
  • 申请详细信息:   CN111620325-A CN10673350 14 Jul 2020
  • 优先权号:   CN10673350

▎ 摘  要

NOVELTY - Method for preparing a graphene nanoribbon array, involves introducing a carbon source gas on the surface of the liquid metal/wetting substrate to perform chemical vapor deposition in a hydrogen and argon atmosphere, and obtaining the graphene nanoribbon array on the surface of the liquid metal/wetting substrate after the deposition is completed. USE - The method is used for preparing a graphene nanoribbon array (claimed). ADVANTAGE - The method greatly reduces the cumbersomeness and cost of the preparation process, and improves the controllability of the edge structure and width of the prepared graphene nanoribbon array.