▎ 摘　　要

NOVELTY - A graphene catalyzed substrate etching solution comprises phosphoric acid solution, glacial acetic acid solution and ferric chloride solution. USE - Graphene catalyzed substrate etching solution. ADVANTAGE - The graphene catalyzed substrate etching solution prevents generation of bubbles and damage of graphene layer, and ensures excellent performance. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for graphene catalyzed substrate etching method, which involves (1) growing graphene on copper foil substrate by chemical vapor deposition method to obtain graphene/copper foil substrate, (2) placing graphene/copper foil substrate on spin coater, absorbing right amount of photoresist, dripping on graphene/copper foil substrate to grow graphene for performing photoresist spin coating, (3) drying graphene/copper foil substrate after spin coating in step (2) at 100-130 degrees C for 1-3 minutes to obtain dried photoresist/graphene/copper foil substrate, (4) placing photoresist/graphene/copper foil substrate in container containing etching solution for 3-5 minutes, (5) after the corrosion is over, replacing etching solution in container with deionized water to obtain pure photoresist/graphene, (6) attaching photoresist/graphene obtained to the surface of substrate, placing in acetone solution for 3-5 minutes, replacing acetone solution with deionized water and drying.