• 专利标题:   Preparing atomic layer deposition auxiliary preparation used for carbon composite material, which is used in field of energy storage or heat conduction, involves depositing metal oxide layer on carbon material by atomic layer deposition.
  • 专利号:   CN113121838-A, CN113121838-B
  • 发明人:   WAN G, WANG G, XU X, ZHOU M
  • 专利权人:   UNIV HAINAN
  • 国际专利分类:   C08G083/00, C08K003/04, C08K007/06, C09K005/14, C23C016/40, C23C016/455
  • 专利详细信息:   CN113121838-A 16 Jul 2021 C08G-083/00 202178 Pages: 13 Chinese
  • 申请详细信息:   CN113121838-A CN10350152 31 Mar 2021
  • 优先权号:   CN10350152

▎ 摘  要

NOVELTY - Preparing atomic layer deposition auxiliary preparation involves depositing a metal oxide layer on the surface of the carbon material by an atomic layer deposition method to obtain a metal oxide/carbon composite material, mixing the metal oxide/carbon composite material with ligand in the solvent to react to obtain metal-organic framework (MOF)/carbon composite material. USE - Method for preparing atomic layer deposition auxiliary preparation used for MOF/carbon composite material, which is used in the field of energy storage, electromagnetic wave absorption or heat conduction (claimed). ADVANTAGE - The method is simple, and the number of MOFs are precisely controlled at the same time, which effectively solves the shortcomings of MOF agglomeration and different particle sizes, and has wide application value.