▎ 摘　　要

NOVELTY - Preparation of amino functionalized graphene/chitosan composite material comprises ultrasonically dispersing graphene oxide in distilled water to a concentration of 5.3-8 mg/mL, adding aqueous ammonia, ultrasonically dispersing for 0.5-1.0 hour, hydrothermal reacting at 180-200 degrees C for 10-12 hours, cooling to room temperature, filtering, washing with 4% hydrochloric acid, ethanol, and distilled water until neutral, and drying; and dissolving chitosan in acetic acid-sodium acetate buffer solution, adding amino functionalized graphene, and sonicating at 30-35 degrees C for 4-6 hours. USE - Method for preparing amino functionalized graphene/chitosan composite material used as copper ion electrochemical sensor electrode material (claimed). ADVANTAGE - The sensor electrode material has high copper ion selectivity detection, excellent performance, and good stability, uses easily obtained raw materials, is environment-friendly, and has simple preparation process and low cost. DETAILED DESCRIPTION - Preparation of amino functionalized graphene/chitosan composite material comprises ultrasonically dispersing graphene oxide in distilled water to a concentration of 5.3-8 mg/mL, adding aqueous ammonia, ultrasonically dispersing for 0.5-1.0 hour, hydrothermal reacting at 180-200 degrees C for 10-12 hours, cooling to room temperature, filtering, washing with 4% hydrochloric acid, ethanol, and distilled water until neutral, and drying to get amino functionalized graphene; and dissolving chitosan in pH 4.4-4.6 acetic acid-sodium acetate buffer solution under heating condition, adding amino functionalized graphene, and sonicating at 30-35 degrees C for 4-6 hours. An INDEPENDENT CLAIM is included for preparation of copper ion electrochemical sensor electrode material comprising taking amino-functionalized graphene/chitosan composite material, coating on glassy carbon electrode, and naturally drying; and taking electrochemical electrode as working electrode and pH 4-6 0.1 mol/L acetic acid/sodium acetate buffer solution, setting parameters of potential window range to - 0.3-0.4V , deposition potential to - 0.7 V, deposition time to 300 seconds, amplitude to 50 mV, step potential to 4 mV, pulse time to 0.5 second, sensitivity to 10-5 A/V, and waiting time to 30 seconds, and carrying out differential pulse voltammetry to detect copper(II) ion.