▎ 摘　　要

NOVELTY - Preparation of high-throughput solvent-resistant organic/non-doped doped amino graphene quantum dot involves thoroughly contacting polyimide ultrafiltration membrane with aqueous monomer solution containing amino-graphene quantum dots and diamine compound, removing aqueous solution of basement membrane surface, drying, contacting dried surface with solution of organic solvent, heat-treating, cooling, obtaining dry compound film, soaking in organic solvent (I), heat-treating, chemically crosslinking, heat-treating, activating and heat-treating. USE - Preparation of high-throughput solvent-resistant organic/non-doped doped amino graphene quantum dot used in water treatment. ADVANTAGE - The method efficiently provides high-throughput solvent-resistant organic/non-doped doped amino graphene quantum dot by simple method. DETAILED DESCRIPTION - Preparation of high-throughput solvent-resistant organic/non-doped doped amino graphene quantum dot involves thoroughly contacting polyimide ultrafiltration membrane as basement membrane with aqueous monomer solution containing amino-graphene quantum dots and diamine compound for 1 second to 30 minutes, removing aqueous solution of basement membrane surface, drying at preset atmosphere for 10-300 seconds, contacting surface of dried base film with solution of organic solvent (I) containing tetraacyl chloride for 1-120 seconds, removing organic phase solution on surface of membrane, heat-treating in an atmosphere of 60-100 degrees C for preset time, naturally cooling in dry environment, obtaining dry compound film, soaking dry composite membrane with organic solvent (I), dissolving to remove excess unreacted acid chloride monomer, heat-treatment at preset temperature and vacuum atmosphere for preset time, chemically crosslinking using crosslinking agent containing organic solvent solution (II) for preset time, heat-treating at preset temperature under vacuum atmosphere for preset time, activating using activation solvent for preset time, and heat-treating.