▎ 摘　　要

NOVELTY - A monocrystal substrate (100) is prepared. The monocrystalline catalyst layer (101) is provided on prepared substrate. The resultant monocrystal substrate is processed, gaseous carbon source is heated and cooled to obtain graphene film (102). USE - Manufacture of graphene film used for photoelectron engineering device e.g. sensor and electrode, and hydrogen storage medium. ADVANTAGE - The method economically provides high-quality and uniform graphene film having excellent efficiency. DESCRIPTION OF DRAWING(S) - The drawing shows the schematic view explaining the manufacture of graphene film. Monocrystal substrate (100) Catalyst layer (101) Graphene film (102)