• 专利标题:   Method for manufacturing surface-patterned current collector, comprises etching and patterning current collector and coating carbon material on patterned current collector, where patterning by etching comprises electrochemical etching.
  • 专利号:   KR2023085886-A
  • 发明人:   JIN A, SUNG G W
  • 专利权人:   UNIV SEOUL NAT SCI TECHNOLOGY RES
  • 国际专利分类:   C23C024/04, C25F003/04, C25F003/14, H01M004/66, H01M004/70
  • 专利详细信息:   KR2023085886-A 14 Jun 2023 H01M-004/70 202351 Pages: 12
  • 申请详细信息:   KR2023085886-A KR169526 07 Dec 2022
  • 优先权号:   KR173769

▎ 摘  要

NOVELTY - Method for manufacturing a surface-patterned current collector comprises etching and patterning the current collector and coating a carbon material on the patterned current collector. The patterning of the current collector by etching comprises electrochemical etching, where etching solution used for electrochemical etching is hydrochloric acid, phosphoric acid, sulfuric acid, nitric acid, acetic acid, carbonic acid, trifluoroacetic acid, oxalic acid, hydrofluoric acid, boric acid, perchloric acid or hypochlorous acid. USE - The method is useful for manufacturing surface-patterned current collector. ADVANTAGE - The method forms anti-oxidation film; improves the stability of the electrode by improving the specific surface area of the current collector by patterning the current collector through electrochemical etching; achieves fine pattern of the current collector; reduces interface resistance by coating thinly and uniformly even on the surface; and improves excellent physical/chemical stability of the current collector. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for surface-patterned current collector manufactured by above method.