▎ 摘　　要

NOVELTY - The method comprises prepurifying a graphene surface (4a), supplying an ozone containing gas to the graphene surface to be cleaned for 100 minutes, irradiating an oxygen containing gas from surrounding air with UV-radiation for the creation of ozone so that the graphene surface is also irradiated with the UV-radiation. The UV-radiation has a wavelength of greater than 235 nm, and is produced by a medium pressure mercury vapor lamp. Before irradiation, UV-radiation has a wavelength of less than 235 nm. USE - The method is useful for removing organic impurities from a graphene surface (claimed). ADVANTAGE - The method ensures economic, effective and rapid removal of organic impurities from the graphene surface with high safety. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for an equipment for removing organic impurities from a graphene surface. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of an equipment for removing organic impurities from a graphene surface. Cleaning chamber (2) Graphene layer (4) Graphene surface (4a) Gas supply device (6) Inlet. (7)