• 专利标题:   Preparation of temperature-sensitive resistor material involves ultrasonically treating graphene-grafted sodium styrene sulfonate, N,N-dimethylformamide and polyvinylidene fluoride mixed solution, and drying.
  • 专利号:   CN102796333-A, CN102796333-B
  • 发明人:   LI C, LIN F, SONG Y, SUN Q, WANG F
  • 专利权人:   HARBIN INST TECHNOLOGY
  • 国际专利分类:   C08F292/00, C08F008/30, C08K003/04, C08K003/08, C08K009/04, C08K009/12, C08L027/16, H01C007/04
  • 专利详细信息:   CN102796333-A 28 Nov 2012 C08L-027/16 201377 Pages: 14 Chinese
  • 申请详细信息:   CN102796333-A CN10327337 06 Sep 2012
  • 优先权号:   CN10327337

▎ 摘  要

NOVELTY - Preparation of temperature-sensitive resistor material involves adding graphene-grafted sodium styrene sulfonate to N,N-dimethylformamide, and ultrasonically dispersing for 0.5-2 hours to obtain solution (S3), adding polyvinylidene fluoride to obtained solution (S3), and heating at 50-70 degrees C to obtain mixed solution of graphene-grafted sodium styrene sulfonate, N,N-dimethylformamide and polyvinylidene fluoride, carrying out ultrasonic treatment of mixed solution for 20-60 minutes, pouring treated solution on clean glass plate, and drying at 70-90 degrees C. USE - Preparation of temperature-sensitive resistor material. ADVANTAGE - The method enables preparation of temperature-sensitive resistor material with negative temperature coefficient effect, high sensitivity and low resistivity. DETAILED DESCRIPTION - Preparation of temperature-sensitive resistor material involves preparing graphite oxide using graphite powder by modified hummers method, adding obtained graphite oxide into N,N-dimethylformamide, carrying out ultrasonic dispersion for 1-3 hours to obtain graphene oxide of N,N-dimethylformamide (S1) (0.1-1 mg/mL), adding azobisisobutyronitrile (5-200 mg) as initiator, sodium styrene sulfonate (0.1-5 g) and graphene oxide of N,N-dimethylformamide solution (S1) into four-neck flask, magnetically-stirring under protection of inert gas for 10-30 minutes, heating at 60-80 degrees C, reacting for 6-24 hours, filtering through 0.22 mu m of micro-porous filtering film, washing obtained filter cake using ethanol, cleaning using deionized water, and drying in vacuum at 30-50 degrees C for 10-24 hours to obtain grafted sodium styrene sulfonate and graphene oxide solid powder, adding obtained solid powder into deionized water, carrying out ultrasonic dispersion to obtain dispersion liquid (S2) (0.1-1 mg/mL), adding hydrazine hydrate solution (60-85 wt.%) into dispersion liquid (S2), magnetically stirring, heating in water bath at 70-90 degrees C for 2-8 hours, filtering, washing resultant product using deionized water, and vacuum-drying at 40-60 degrees C for 10-24 hours to obtain graphene-grafted sodium styrene sulfonate, adding obtained graphene-grafted sodium styrene sulfonate (20-100 mg) to N,N-dimethylformamide (50-200 mL), and carrying out ultrasonic dispersion for 0.5-2 hours to obtain solution (S3), adding polyvinylidene fluoride to obtained solution (S3), and heating at 50-70 degrees C to obtain graphene-grafted sodium styrene sulfonate, N,N-dimethylformamide and polyvinylidene fluoride mixed solution, carrying out ultrasonic treatment of mixed solution for 20-60 minutes, pouring treated solution on clean glass plate, and drying the glass plate at 70-90 degrees C for 6-12 hours. The volume ratio of dispersion liquid (S2) and hydrazine hydrate solution is 100:1-2000:1. The mass ratio of graphene-grafted sodium styrene sulfonate, and polyvinylidene fluoride is 1:100-1:10.