• 专利标题:   Ionic barristor for integrated tunneling field effect transistor (TFET) device has graphene layer on transition-metal dichalcogenide (TMD) layer and that extends over isolation layer adjacent to TMD layer.
  • 专利号:   US2017229576-A1, US9812568-B2
  • 发明人:   CHO K, NIE Y, HONG S, WALLACE R M
  • 专利权人:   UNIV TEXAS SYSTEM
  • 国际专利分类:   H01L029/16, H01L029/165, H01L029/45, H01L029/78, H01L029/786, H03K017/687
  • 专利详细信息:   US2017229576-A1 10 Aug 2017 H01L-029/78 201757 Pages: 18 English
  • 申请详细信息:   US2017229576-A1 US015875 04 Feb 2016
  • 优先权号:   US015875

▎ 摘  要

NOVELTY - The ionic barristor (200) has a TMD layer (201), and a graphene layer (203) disposed on TMD layer and extending over an isolation layer adjacent to the TMD layer. An electrolyte layer (204) is disposed on the graphene layer. A source gate contact (205) is disposed on the electrolyte layer. A source contact (206) is set on the graphene layer. The electrolyte contains lithium, hexafluorophosphate. The TMD layer contains molybdenum disulfide, tungsten diselenide, or zirconium(IV) sulfide. USE - Ionic barristor for integrated TFET device. ADVANTAGE - The integration of devices results in faster switching speed than the standalone ionic barristor since logic functionality of the TFET is realized when the gate-source voltage set static. The faster switching speed is possible by improving the ohmic contact to the TMD layer using the ionic barristor. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method of operating an ionic barristor. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of operating an ionic barristor. Ionic barristor (200) TMD layer (201) Graphene layer (203) Electrolyte layer (204) Source gate contact (205) Source contact (206)