▎ 摘　　要

NOVELTY - The method involves forming a carbon source layer in a target substrate. A metal catalytic layer is deposited on the carbon source layer that is provided with a target substrate layer. A graphene layer is formed with the metal catalytic layer. The target substrate is formed with a graphene interconnection line. A bag is provided with the target substrate on a device layer and a copper interconnection structure. USE - Graphene interconnection line forming method. ADVANTAGE - The method enables preventing demage of a graphene thin film. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a graphene interconnection line forming method. '(Drawing includes non-English language text)'