• 专利标题:   Transistor structure, comprises graphene layer located on insulating layer, first metal portion overlying portion of graphene layer, second metal portion contacting and overhanging first metal portion, first electrode, and second electrode.
  • 专利号:   US2013009133-A1, US8680512-B2
  • 发明人:   AVOURIS P, FARMER D B, LIN Y, ZHU Y
  • 专利权人:   INT BUSINESS MACHINES CORP
  • 国际专利分类:   B82Y099/00, H01L029/76
  • 专利详细信息:   US2013009133-A1 10 Jan 2013 H01L-029/76 201306 Pages: 15 English
  • 申请详细信息:   US2013009133-A1 US614530 13 Sep 2012
  • 优先权号:   US876454, US614530

▎ 摘  要

NOVELTY - Transistor structure comprises: a graphene layer located on an insulating layer (12); a first metal portion (50) overlying a portion of the graphene layer (20); a second metal portion contacting and overhanging the first metal portion; a first electrode contacting a portion of the graphene layer and laterally offset from a first sidewall of the first metal portion by a lateral spacing; and a second electrode contacting another portion of the graphene layer and laterally offset from a second sidewall of the first metal portion by the lateral spacing. USE - Used as transistor structure. DESCRIPTION OF DRAWING(S) - The figure shows a schematic view of the structure. Insulating layer (12) Graphene layer (20) Dielectric seed layer (30) Gate dielectric (40) First metal portion (50)