• 专利标题:   Graphene quantum dot pattern useful for bio-imaging, contrast agent and drug carrier, comprises graphene quantum dots uniformly patterned on substrate through ion beam irradiation.
  • 专利号:   KR2352572-B1
  • 发明人:   HA J M, LEE S H, LEE C Y, HWANGYONGSUK, SUK J, KIM C
  • 专利权人:   KOREA ATOMIC ENERGY RES INST
  • 国际专利分类:   B82B001/00, B82B003/00, B82Y020/00, B82Y040/00, C01B032/184, C09K011/65
  • 专利详细信息:   KR2352572-B1 18 Jan 2022 B82B-001/00 202213 Pages: 15
  • 申请详细信息:   KR2352572-B1 KR090599 21 Jul 2020
  • 优先权号:   KR090599

▎ 摘  要

NOVELTY - Graphene quantum dot pattern comprises graphene quantum dots uniformly patterned on a substrate through ion beam irradiation. The patterned graphene quantum dots have a particle size of 0.1-10 nm. USE - The graphene quantum dot pattern is useful for bio-imaging, contrast agent and drug carrier. ADVANTAGE - The graphene quantum dot pattern: has high biocompatibility with light-emitting characteristics in the visible range and has excellent thermal and electrical conductivity; controls the size constantly through bottom-up method; and does not use etchant, acid or harmful chemicals on the substrate; and is suitable in the field of pharmaceuticals. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for manufacturing the graphene quantum dot pattern, comprising (a) implanting a metal catalyst source into the substrate through selective ion beam irradiation, (b) heating the substrate on which the metal catalyst source is injected to form metal catalyst particles having particle size of 0.1-10 nm, and (c) removing the metal catalyst by providing gaseous carbon flow on the substrate on which the metal catalyst particles are formed, and patterning graphene quantum dots.