• 专利标题:   Chemically-modified graphene comprises a graphene layer and functional groups that are grafted to graphene layer, where each layer comprises substituted carboxylic acid compound.
  • 专利号:   US2013137894-A1, TW201321303-A, US9181167-B2, TW496739-B1
  • 发明人:   HUA M, CHEN S, CHEN H, TSAI R, FENG W, JENG M, CHEN X, CAI R, ZHENG M
  • 专利权人:   UNIV CHANG GUNG
  • 国际专利分类:   C07C051/083, C07C057/42, C01B031/04, C07C059/76
  • 专利详细信息:   US2013137894-A1 30 May 2013 C07C-051/083 201342 Pages: 11 English
  • 申请详细信息:   US2013137894-A1 US617672 14 Sep 2012
  • 优先权号:   TW143962

▎ 摘  要

NOVELTY - Chemically-modified graphene comprises: a graphene layer; and many functional groups that are grafted to the graphene layer, where each layer comprises substituted carboxylic acid compound (I). USE - Used as chemically-modified graphene. ADVANTAGE - The chemically-modified graphene has good dispersion ability. DETAILED DESCRIPTION - Chemically-modified graphene comprises: a graphene layer; and many functional groups that are grafted to the graphene layer, where each layer comprises substituted carboxylic acid compound of formula (-CO-R-COOH) (I). R = 1-5C alkylene (preferably ethylene) or 1-5C alkenylene (preferably vinylene) (both optionally substituted). An INDEPENDENT CLAIM is also included for producing the chemically-modified graphene, comprising subjecting a cyclic anhydride and graphite to a Friedel-Crafts reaction in the presence of a Lewis acid.