▎ 摘　　要

NOVELTY - Transferring graphene to plexiglass substrate comprises growing single layer of graphene on metal foil; placing graphene/metal foil between two smooth and flat carriers, and flattening metal foil; spin-coating layer of photoresist on surface of graphene for curing; preparing etching solution for metal foil, placing photoresist/graphene/metal foil in etching solution to etch metal foil, and contacting metal foil and etching with liquid under buoyancy of photoresist; etching metal foil, and using poly-methyl methacrylate (PMMA) target substrate to get photoresist/graphene; releasing photoresist/graphene into deionized water for rinsing, placing photoresist/graphene/PMMA target substrate on experimental table and blow drying; putting photoresist/graphene/PMMA target substrate on hot plate for drying; performing UV exposure on the photoresist on surface of photoresist/graphene/PMMA target substrate; and using developer to develop, rinsing with deionized water, and drying. USE - The method is used for transferring graphene to plexiglass substrate. ADVANTAGE - The method has high success rate, and does not leave photoresist impurities.