▎ 摘　　要

NOVELTY - The pellicle (100) has a substrate (10) whose central portion is formed with an opening (13). A support layer is formed on the substrate to cover the opening. A pellicle layer containing amorphous carbon and a core layer (20) are formed on a support layer. A capping layer (30) with thickness of 10 nm or less is formed in the core layer. The core layer is made of graphene, zirconium or molybdenum and nitride, boride, carbide or silicide. A buffer layer made of the carbon is formed between the support layer and core layer or between the core and capping layers. USE - Pellicle i.e. consumable component for protecting a mask from contaminants in a lithography process for semiconductor or display manufacturing. ADVANTAGE - The pellicle allows reflectance to-be lowered without a significant change of the extreme UV transmittance, thus forming a capping layer stably on a core layer formed of graphene, and hence improving degree of semiconductor integration dramatically. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for manufacturing a pellicle for extreme ultraviolet lithography. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of a pellicle. 10Substrate 13Opening 20Core layer 30Capping layer 100Pellicle