▎ 摘　　要

NOVELTY - The substrate has a silicon carbide layer is covered with a patterned graphene film that is fixed on a silicon carbide layer surface. The silicon carbide layer surface is fixed with a window. Width of the window is about 10-3000 nm. Atomic range of the silicon carbide layer surface is about 0.1-3 microns. USE - Epitaxial patterning substrate. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for an epitaxial patterning substrate manufacturing method. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating an epitaxial patterning substrate manufacturing method. '(Drawing includes non-English language text)'