• 专利标题:   Method for producing layered structure, involves forming patterned polymer layer on graphene layer by spatially selectively curing portions of polymeric material, and removing uncured polymeric material to expose graphene layer.
  • 专利号:   DE102015203029-A1
  • 发明人:   WOLFF A, NESS F, BRUNOTTE R
  • 专利权人:   IHP GMBHINNOVATIONS HIGH PERFORMANCE MI
  • 国际专利分类:   H01L029/78, H01L049/02
  • 专利详细信息:   DE102015203029-A1 19 May 2016 H01L-049/02 201635 Pages: 9 German
  • 申请详细信息:   DE102015203029-A1 DE10203029 19 Feb 2015
  • 优先权号:   DE10223425

▎ 摘  要

NOVELTY - The method involves providing (S1) a substrate having a graphene layer located on the substrate. The graphene layer is covered (S2) with a fluent UV curable polymeric material. A patterned polymer layer (S3) is formed on the graphene layer by spatially selectively curing portions of the polymeric material by UV-light source. The uncured polymeric material is removed (S4) to expose first surface area of the graphene layer. USE - Method for producing layered structure (claimed). ADVANTAGE - The UV hardened polymer layer is free from there from curing agent residues. The layered structure is manufactured in flexible way. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the layered structure. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating the process of producing layered structure. Step to provide substrate having graphene layer (S1) Step to cover graphene layer (S2) Step to form patterned polymer layer (S3) Step to remove uncured polymeric material (S4) Step to form electrical conductive layer on patterned polymer layer (S5)