▎ 摘　　要

NOVELTY - Method for controlling the infrared emissivity of a coating involves (i) diluting a film-forming resin with an organic solvent to form a binary homogeneous system, (ii) adding an infrared absorbing material, a dispersant and a curing agent to the binary homogeneous system to obtain a coating material, (iii) spraying the coating material obtained in step (ii) onto a substrate, and (iv) curing the substrate sprayed with the coating material under constant temperature and humidity conditions by adjusting the temperature and humidity, where the binary homogeneous system of the coating material phase separates during the curing process, and the rich phase forms the pore wall of the material during the curing process, and removing the space left after the lean phase forms holes on the surface of the coating to obtain high-infrared emissivity coating with porous surface. USE - Method for controlling the infrared emissivity of a coating. ADVANTAGE - The pores formed on the surface of the coating have micron-scale pores that match the wavelength of infrared light, which can effectively improve the infrared absorption performance of the coating by forming a light trapping effect, thus obtaining a coating with high infrared emissivity.