• 专利标题:   Integrated forming method of ultraviolet ultra-fast laser processing high specific surface area graphene, involves obtaining high specific surface area of activated graphene film in ultraviolet ultra-fast laser in situ processing material film, and cleaning activated graphene thin dry treated.
  • 专利号:   CN114671428-A, CN114671428-B
  • 发明人:   GAO J, CHEN X, CHEN Y, XIE B, LIU H
  • 专利权人:   UNIV GUANGDONG TECHNOLOGY
  • 国际专利分类:   C01B032/184, C01B032/194, C01B032/196
  • 专利详细信息:   CN114671428-A 28 Jun 2022 C01B-032/184 202263 Chinese
  • 申请详细信息:   CN114671428-A CN10482715 05 May 2022
  • 优先权号:   CN10482715

▎ 摘  要

NOVELTY - The method involves selecting (S1) the carbon precursor material, the carbon precursor material is selected from one of biomass/hydrogel composite material and heavy hydrocarbon compound. The activating agent solution is added (S2) on the carbon precursor material inner part forming composite material of activator uniform load, spreading the composite material on the flexible substrate to form a precursor material layer. The precursor material layer heating is dried (S3). The composite material film of the carbon precursor material inner part and the loading activator crystal is obtained. A high specific surface area of the activated graphene film in the ultraviolet ultra-fast laser in situ processing the composite material film is obtained (S4). The activated graphene thin dry treated is cleaned (S5). USE - Integrated forming method of UV ultra-fast laser processing high specific surface area graphene thin film for flexible micro-nano energy storage device and electronic equipment. ADVANTAGE - The method can directly process the high specific surface area in situ on the flexible substrate, the activated graphene film of the micro-satisfy flexible micro-energy storage device field, the requirement of the micropore electrode, solving the problem of complex process and high cost of the existing technology for processing activated microporous film graphene, and the controllability is bad. DESCRIPTION OF DRAWING(S) - The drawing shows a flow chart of an integrated forming method of ultraviolet ultra-fast laser processing high specific surface area graphene. (Drawing includes non-English language text). Step for selecting carbon precursor material (S1) Step for adding activating agent solution (S2) Step for drying precursor material layer heating (S3) Step for obtaining high specific surface area of activated graphene film (S4) Step for cleaning activated graphene thin dry treated (S5)