▎ 摘　　要

NOVELTY - A gas barrier thin film comprises: substrate (10); first inorganic oxide layer (30a); and first graphene layer (20a) between substrate and first inorganic oxide layer. USE - As gas barrier thin film for use as encapsulation thin film in electronic devices including battery, organic light emitting device, display device, photovoltaics, integrated circuit, pressure sensor, chemical sensor, bio sensor, photovoltaic device, and lighting device (claimed). The photovoltaic device is e.g. dye-sensitized solar cell. ADVANTAGE - In gas barrier thin film graphene in graphene layer has compact structure in which six-membered rings of carbon are repeated. Thus graphene prevents or reduces penetration of gas and vapor. In addition, because graphene has only thickness of 0.6 nm, graphene has improved light transmittance and flexibility. In addition, because graphene has improved hydrophobic properties compared to thin film formed of metal, graphene also prevents or reduces penetration of moisture. Thus, thin film including single layer and several layers formed of graphene simultaneously has flexibility, light transmittance, gas barrier properties, and moisture barrier properties. When used as encapsulating thin film in electronic device, gas barrier thin film prevents or reduces penetration of oxygen and moisture and has improved light transmittance and flexibility, higher tolerance with respect to diffusion of compounds, and prolongs lifetime of electronic device. When used in photovoltaic device such as dye-sensitized solar cell, because gas barrier thin film has flexibility as well as higher transparency and improved property of preventing or reducing penetration of moisture, gas barrier thin film protects dye-sensitized solar cell without adversely affecting performance of cell. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for method of preparing gas barrier thin film, involving: forming graphene layer by transferring graphene on surface of substrate; and forming inorganic oxide layer by depositing inorganic oxide on graphene layer. DESCRIPTION OF DRAWING(S) - The figure shows schematic cross-sectional view of the gas barrier thin film. Substrate (10) First graphene layer (20a) Second graphene layer (20b) Third graphene layer (20c) First inorganic oxide layer (30a) Second inorganic oxide layer (30b) Third inorganic oxide layer (30c)