• 专利标题:   Light-Fenton system useful for producing hydrogen peroxide comprises adding graphitic carbon nitride/reduced graphene oxide to the Fenton system.
  • 专利号:   CN108203149-A
  • 发明人:   WANG Y, SONG H, WU X, FANG J, GAO Y
  • 专利权人:   UNIV XIAN TECHNOLOGICAL
  • 国际专利分类:   B01J027/24, C02F001/30, C02F001/72
  • 专利详细信息:   CN108203149-A 26 Jun 2018 C02F-001/72 201849 Pages: 5 Chinese
  • 申请详细信息:   CN108203149-A CN10051687 19 Jan 2018
  • 优先权号:   CN10051687

▎ 摘  要

NOVELTY - Light-Fenton system comprises graphitic carbon nitride/reduced graphene oxide (g-C3N4/rGO) added to the Fenton system in the ratio r:g-C3N4 of 1:0.15. USE - The light-Fenton system is useful for producing hydrogen peroxide (claimed). ADVANTAGE - The light-Fenton system uses graphene modified g-C3N4 having good electrical conductivity, reduces electron enthalpy hole recombination, enhances oxidation efficiency and continuously generates H2O2 and catalyst increases rate of wastewater degradation.