• 专利标题:   Preparing carbon-silicon three-dimensional structure composite material, involves dissolving graphene quantum dot in ultrapure water, dripping in copper(II) chloride or zinc chloride solution, mixing mixed emulsifier with e.g. graphite oxide aqueous solution and adding hydrazine hydrate to emulsion.
  • 专利号:   CN113415804-A, CN113415804-B, US2023033233-A1
  • 发明人:   WU X, ZHANG E
  • 专利权人:   XIAMEN HAICHEN NEW ENERGY TECHNOLOGY CO, XIAMEN HITHIUM NEW ENERGY TECHNOLOGY CO
  • 国际专利分类:   C01B033/02, C01B032/194, C01B032/184, H01M004/36, H01M004/38, H01M004/62, B82Y030/00, B82Y040/00, C01B032/198, H01M004/587
  • 专利详细信息:   CN113415804-A 21 Sep 2021 C01B-033/02 202191 Pages: 7 Chinese
  • 申请详细信息:   CN113415804-A CN10863229 29 Jul 2021
  • 优先权号:   CN10863229

▎ 摘  要

NOVELTY - Method for preparing a carbon-silicon three-dimensional structure composite material, involves (a) dissolving 0.004-0.006 g graphene quantum dot in 4-6 ml ultrapure water, dripping in 0.65-0.85 ml 0.2-0.3 mol/ml copper(II) chloride or zinc chloride solution, and shaking to obtain a mixed emulsifier, (b) mixing the mixed emulsifier with 10-20 ml 10-20 mg/ml graphite oxide aqueous solution and 10-20 ml cyclohexane solution containing 0.1-0.2 g nano-silicon spheres and homogenizing for 20-30 seconds to obtain a uniform oil-in-water type emulsion, (c) adding 0.9-1.2 g hydrazine hydrate to the emulsion for reduction, and hydrothermally reacting to obtain a reduced emulsion and (d) freeze-drying the reduced emulsion, washing with a washing solution and drying in vacuum to obtain the product. USE - The method is useful for preparing a carbon-silicon three-dimensional structure composite material (claimed). ADVANTAGE - The method solves problems of volume expansion of silicon material and cracking and collapse of electrode material structure.