▎ 摘　　要

NOVELTY - Patterned arrangement of solution state grapheme comprises: (a) treating the substrate: forming a solvent steeped zone and a non-steeped zone of the graphene solution on the surface of the substrate; and (b) dropping the graphene solution on the substrate obtained in step (a); then carrying out the film swinging treatment to the substrate; and then thermally treating the substrate to obtain the patterned arrangement of graphene. USE - The method is useful for the patterned arrangement of solution state grapheme (claimed) used in organic electronics. ADVANTAGE - The method which is low in cost can be used in a large scale and is applicable to many kinds of substrates, so that it expands the application range of the method for preparing graphene by solution method and strengthens the application perspective.