• 专利标题:   Patterned arrangement of solution state grapheme comprises treating substrate, dropping graphene solution on substrate obtained then carrying out film swinging treatment, and thermally treating substrate.
  • 专利号:   CN101648182-A, CN101648182-B
  • 发明人:   DI Z, GUO Y, LIU H, LIU Y, YU G
  • 专利权人:   CHINESE ACAD SCI CHEM INST
  • 国际专利分类:   B05D005/00, B05D007/00, C08J007/00, C08J007/02
  • 专利详细信息:   CN101648182-A 17 Feb 2010 B05D-005/00 201019 Pages: 13 Chinese
  • 申请详细信息:   CN101648182-A CN10092359 07 Sep 2009
  • 优先权号:   CN10092359

▎ 摘  要

NOVELTY - Patterned arrangement of solution state grapheme comprises: (a) treating the substrate: forming a solvent steeped zone and a non-steeped zone of the graphene solution on the surface of the substrate; and (b) dropping the graphene solution on the substrate obtained in step (a); then carrying out the film swinging treatment to the substrate; and then thermally treating the substrate to obtain the patterned arrangement of graphene. USE - The method is useful for the patterned arrangement of solution state grapheme (claimed) used in organic electronics. ADVANTAGE - The method which is low in cost can be used in a large scale and is applicable to many kinds of substrates, so that it expands the application range of the method for preparing graphene by solution method and strengthens the application perspective.