▎ 摘　　要

NOVELTY - Forming a pattern in a substrate material involves positioning a layer of a covalent organic framework polymer that includes nanoscale pores therein over the substrate material as a template having nanoscale pores therein to form a templated assembly and applying an etching process to the templated assembly. USE - Method for forming pattern in substrate material. ADVANTAGE - The method has improved onset potential for the multi-metallic GNC composite (NiFe) over the single metal (Ni). DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a composition, which comprises a layer of a covalent organic framework polymer comprising nanoscale pores over a substrate material and different from the COF.