• 专利标题:   Device for preparing graphene comprises negative ion source, analyzing magnet for adjusting cluster ion beam to proper size, scanning system used for scanning analyzing magnet cluster ion, sample frame, beam integrator, and vacuum chamber.
  • 专利号:   CN102659098-A, CN102659098-B
  • 发明人:   FU D, WANG Z, ZHANG Z
  • 专利权人:   UNIV WUHAN
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   CN102659098-A 12 Sep 2012 C01B-031/04 201323 Pages: 11 Chinese
  • 申请详细信息:   CN102659098-A CN10157870 21 May 2012
  • 优先权号:   CN10157870

▎ 摘  要

NOVELTY - Device for preparing graphene comprises negative ion source used for generating ion cluster; analyzing magnet used for deflecting from negative ion source of ion cluster to the needed cluster ions from the ions in the cluster and for adjusting the cluster ion beam to the proper size; scanning system used for scanning the analyzing magnet cluster ion; sample frame; beam integrator; and vacuum chamber. The sample frame comprises metal rod, insulator, sample plate, beam jack, and diaphragm, which is located between the sample plate and scanning system and faces the sample plate. USE - Device for preparing graphene (claimed) used as lithium ion battery and supercapacitor electrode material. ADVANTAGE - The device provides large-area graphene with less defects, less number of layers, and uniformly distributed layers. DETAILED DESCRIPTION - Device for preparing graphene comprises negative ion source used for generating ion cluster; analyzing magnet used for deflecting from negative ion source of ion cluster to the needed cluster ions from the ions in the cluster and for adjusting the cluster ion beam to the proper size; scanning system used for scanning the analyzing magnet cluster ion; sample frame; beam integrator; and vacuum chamber. The negative ion source, analyzing magnet, scanning system, and sample frame are located in the vacuum chamber. The sample frame comprises metal rod, insulator, sample plate, beam jack, and diaphragm, which is located between the sample plate and scanning system and faces the sample plate. The sample plate is connected to the beam integrator and passes through the beam jack. An INDEPENDENT CLAIM is included for a method of using the device for preparing graphene.