▎ 摘　　要

NOVELTY - Preparation of patterned array involves (s1) preparing a substrate (B) containing microstructure array, and performing high energy radiation treatment, (s2) dissolving the raw material of substrate(A) in an organic solvent to prepare substrate (A) with a hydrophilic group on the surface, (s3) applying stress to substrate (A), and keeping in stretched state, (s4) adding a solution containing functional material to the surface of substrate (A), (s5) superimposing substrate (B) with substrate (A) to form a sandwich structure, and (s6) volatilizing the solvent, separating the substrates, and releasing the substrate (A). USE - Preparation of patterned array e.g. zero-dimensional, one-dimensional, two-dimensional or three-dimensional patterned array for photoelectric device, smart sensor, electronic skin, photonic skin, smart skin, co-antenna, flexible wearable device, supercapacitor, energy harvesting device, self-powered triboelectric nanogenerator, high sensitivity sensor, photodetector device, grating, organic light emitting diode, solar cell, waveguide, field effect transistor, flexible thin film electrode, or biochip (all claimed), and display device. ADVANTAGE - The method is simple, environmentally-friendly, and low in cost, provides fine pattern refinement degree and high integration degree, improves the flexible tensile and rebound performance of substrate (A) and precision of the integrated density and microstructure of the template printing patterned array.