• 专利标题:   Manufacture of graphene barrier film for e.g. electronic device, involves forming graphene precursor layer on catalyst layer, forming graphene layer and protective layer, removing catalyst layer and providing graphene layer to substrate.
  • 专利号:   KR2018011662-A, KR1851171-B1
  • 发明人:   KIM M J, SEO T H, LEE S, KIM S M, AHN S, BAE S, SON D I
  • 专利权人:   KOREA INST SCI TECHNOLOGY
  • 国际专利分类:   B32B037/24, B32B009/00, B32B009/04, C23C014/06, C23C014/08, C23C016/02, C23C016/26, C23C016/52, C23C016/56
  • 专利详细信息:   KR2018011662-A 02 Feb 2018 B32B-037/24 201816 Pages: 22
  • 申请详细信息:   KR2018011662-A KR094336 25 Jul 2016
  • 优先权号:   KR094336

▎ 摘  要

NOVELTY - Manufacture of graphene barrier film involves performing primary chemical vapor deposition process on a metal catalyst layer to form a graphene precursor layer, performing secondary chemical vapor deposition process on the graphene precursor layer such that graphene precursor layer is converted to a graphene layer, forming a polymer protective layer on the graphene layer, removing the metal catalyst layer from one side of the graphene layer, transferring the graphene layer to a target substrate. The graphene barrier film has thickness of 100 nm or less. USE - Manufacture of graphene barrier film used for electronic device and foodstuff packaging material. ADVANTAGE - The method enables efficient manufacture of graphene barrier film with excellent surface smoothness, water barrier property, and gas barrier property.