• 专利标题:   Producing graphene, comprises providing a substrate containing material with providing gas containing carbon monoxide (II) and bringing the gas into contact with the substrate and keeping it at temperature to graphene on substrate surface.
  • 专利号:   WO2021002770-A1
  • 发明人:   GREBENKO A K, KRASNIKOV D V, NASIBULIN A G
  • 专利权人:   SKOLKOVO INST SCI TECHNOLOGY AUTONOMOU
  • 国际专利分类:   B82B003/00, B82Y040/00, C01B032/186
  • 专利详细信息:   WO2021002770-A1 07 Jan 2021 C01B-032/186 202110 Pages: 36 Russian
  • 申请详细信息:   WO2021002770-A1 WORU000579 16 Aug 2019
  • 优先权号:   RU120973

▎ 摘  要

NOVELTY - Producing graphene, comprises: (a) providing a substrate containing a material having a carbon solubility of at least 10-6 at.% at the temperature of the stage; with (b) providing a gas containing carbon monoxide (II); (c) bringing the gas into contact with the substrate and keeping it at a temperature of 600-2000 degrees C to obtain graphene on the substrate surface. USE - The method is useful for producing graphene. ADVANTAGE - The method: provides monolayer single-crystal graphene with low number of defects using reproducible and highly scalable method; produces graphene that is easy to transfer, scale up and implement on industrial scale; and produces graphene that would provide high rate of production of graphene and would provide graphene of high quality, preferably with low number of defects, mainly predominantly single-layer. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for graphene characterized in that the ratio of the 2D peak intensity to the G peak intensity in Raman spectrum is at least 2, and the ratio of the area under the G peak to the area under the D peak in it Raman spectrum is not greater than 0.02.