▎ 摘　　要

NOVELTY - Manufacture of carbon-based thin film shadow mask involves (a) forming a buffer layer on the substrate, (b) depositing a metal layer on the buffer layer and then patterning, (c) forming an amorphous carbon layer on the patterned metal layer, (d) forming a crystalline carbon layer on the buffer layer by exchanging the metal layer and the carbon layer, (e) removing the amorphous carbon layer exposed to the outside, (f) removing the metal layer, and (g) separating the buffer layer and the crystalline carbon layer. The thickness (ta-C) of the amorphous carbon layer and the thickness (tm) of the metal layer are formed by depositing to satisfy the following relational expression satisfy preset relation (I). USE - Manufacture of carbon-based thin film shadow mask (claimed). ADVANTAGE - The method provides carbon-based thin film shadow mask with a small thickness, a large area, minimized shadow effect, so that a fine pattern is possible and a high-resolution pattern can be manufactured and lowers the coefficient of thermal expansion.