• 专利标题:   Graphene transistor has graphene oxide layer whose upper side is arranged coplanar to upper side of graphene active layer.
  • 专利号:   WO2012169720-A1, KR2012136118-A, KR1245353-B1
  • 发明人:   AN S J
  • 专利权人:   KUMOH NAT INST TECHNOLOGY IND ACAD COOP
  • 国际专利分类:   H01L021/336, H01L029/78
  • 专利详细信息:   WO2012169720-A1 13 Dec 2012 H01L-029/78 201301 Pages: 20
  • 申请详细信息:   WO2012169720-A1 WOKR001434 24 Feb 2012
  • 优先权号:   KR055138

▎ 摘  要

NOVELTY - The transistor has a graphene active layer (110) that is mounted on an insulating substrate (100). A gate electrode is mounted on the graphene active layer. A graphene oxide layer is equipped between the graphene active layer and gate electrode. The upper side of graphene oxide layer is arranged coplanar to the upper side of graphene active layer. The graphene oxide layer is provided within the top of graphene active layer. Source/drain electrodes are respectively provided on upper sides of source/drain domain frame. USE - Graphene transistor. ADVANTAGE - Since the upper side of graphene oxide layer is arranged coplanar to the upper side of graphene active layer, the mobility and operation speed of graphene transistor can be improved. The manufacturing process of graphene transistor can be simplified. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for manufacturing method of graphene transistor. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view illustrating the manufacturing process of graphene transistor. Insulating substrate (100) Graphene active layer (110) Gate insulating layer (120) Resist pattern (132)