• 专利标题:   Memristor based on ferroelectric top gate used in e.g. semiconductor field, has resistance change layer set between first electrode and second electrode, ferroelectric layer set on resistance change layer, and top gate set on ferroelectric layer.
  • 专利号:   CN114824071-A
  • 发明人:   ZHANG Y, LUO M, WANG Y, GAO Z, ZHOU Y, LV Z, HAN S
  • 专利权人:   UNIV SHENZHEN
  • 国际专利分类:   G11C011/22, H01L045/00
  • 专利详细信息:   CN114824071-A 29 Jul 2022 H01L-045/00 202277 Chinese
  • 申请详细信息:   CN114824071-A CN10392593 14 Apr 2022
  • 优先权号:   CN10392593

▎ 摘  要

NOVELTY - Memristor based on ferroelectric top gate, comprises a first electrode and a second electrode arranged on a substrate at intervals. A resistance change layer is set between the first electrode and the second electrode. A ferroelectric layer is set on the resistance change layer. A top gate is set on the ferroelectric layer. USE - Memristor based on ferroelectric top gate used in semiconductor field, and information storage and emerging brain-type calculation field. ADVANTAGE - The memristor: utilizes the ferroelectric effect to control the storage effect of the memristor; can realize the bidirectional and non-volatile control of the memristor behavior; and utilizes the ferroelectric effect to optimize the memory performance of the device during the control process, e.g. reducing the device operating voltage, multi-bit storage and fast write/erase operations. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are also included for: preparation method of memristor based on ferroelectric top gate; and control method of memristor storage model. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the memristor based on ferroelectric top gate used in e.g. semiconductor field (Drawing includes non-English language text).