• 专利标题:   Surface processing for improving antistatic performance of electronic component comprises soaking electronic component into liquid nitrogen for cryogenic treatment, processing, taking out and storing in low temperature.
  • 专利号:   CN112452686-A
  • 发明人:   ZHAO Q, HU S
  • 专利权人:   ANHUI WEINENG ENERGY TECHNOLOGY CO LTD
  • 国际专利分类:   B05D003/04, B05D003/14, B05D005/12, C09D163/00, C09D193/02, C09D005/24, C09D007/61, C09D007/65
  • 专利详细信息:   CN112452686-A 09 Mar 2021 B05D-005/12 202130 Pages: 13 Chinese
  • 申请详细信息:   CN112452686-A CN11437312 11 Dec 2020
  • 优先权号:   CN11437312

▎ 摘  要

NOVELTY - Surface processing for improving antistatic performance of electronic component comprises (i) soaking the electronic component into liquid nitrogen for cryogenic treatment, processing for 20-30 minutes, taking out and storing in the low temperature environment, (ii) adding the electronic component after cryogenic treatment in the step (i) into a corona discharge instrument for corona treatment, corona processing for 30-40 seconds, and taking out, (iii) adding the electronic component after corona treatment in the step (ii) in RFcold plasma processing device, processing for 5-10 minutes and taking out the electronic component , and (iv) uniformly coating the antistatic coating on the surface of the electronic component after low temperature plasma treatment in the step (iii), and naturally drying. USE - The method is useful for surface processing for improving antistatic performance of electronic component. ADVANTAGE - The method: improves the antistatic performance of electronic components, corona treatment, low-temperature plasma treatment and coating treatment on electronic components, improves the surface performance of electronic components, and its antistatic performance improves the quality of the product.