▎ 摘　　要

NOVELTY - The method involves transferring a graphene thin film layer (104) onto a surface of a photosensitive film (102). The photosensitive film having the graphene thin film layer is transferred and attached to a substrate (110). A mask having a predetermined pattern is placed above the graphene thin film layer. The graphene thin film layer is patterned through photolithography process. USE - Method for forming graphene pattern. ADVANTAGE - Stability and reliability of the graphene micro-pattern can be secured efficiently. Visibility of the photosensitive film can be improved. DESCRIPTION OF DRAWING(S) - The drawings show the sectional views illustrating the method for forming graphene pattern. Graphene embedded dry photosensitive film (100) Photosensitive film (102) Graphene thin film layer (104) Substrate (110)