• 专利标题:   Method for forming patterns of two-dimensional material as graphene for optical application, such as electro-optical device using masking block, involves bonding growth substrate, and synthesizing pattern of two-dimensional material.
  • 专利号:   KR2021066593-A, KR2274207-B1
  • 发明人:   PARKJAEHYUN, LEE D J
  • 专利权人:   KOREA INST SCI TECHNOLOGY
  • 国际专利分类:   H01L021/02, H01L021/027, H01L021/324, H01L021/768, H01L021/78
  • 专利详细信息:   KR2021066593-A 07 Jun 2021 H01L-021/768 202149 Pages: 19
  • 申请详细信息:   KR2021066593-A KR156025 28 Nov 2019
  • 优先权号:   KR156025

▎ 摘  要

NOVELTY - The method involves providing liquid hydrocarbon between the masking block and the growth substrate including a growth layer made of two-dimensional material. The growth substrate and the masking block are bonded by heating the growth substrate and the masking block in physical contact. A pattern of a two-dimensional material is synthesized by providing a source material on the growth substrate. The masking block is separated from the growth substrate. The growth substrate and the masking block are bonded, and fine graphene is formed in an interface region between the growth substrate and the masking block. USE - Method for forming patterns of a two-dimensional material as graphene for optical application such as electro-optical device using a masking block. ADVANTAGE - The debonding process is easily performed by preventing chemical bonding with the masking block./dingly. The influence of impurities such as oxygen molecules are minimized, and, high-quality graphene with suppressed defects obtained by process synthesizing graphene process at the interface. A graphene thin film pattern is obtained without a separate patterning process by increasing the selectivity of graphene synthesis. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the method for forming patterns of a two-dimensional material as graphene for optical application using a masking block.