• 专利标题:   Method for producing graphene layer on substrate, involves applying graphene ink and solvent that is butyl carbitol acetate to substrate, curing graphene ink layer, followed by applying graphene filler to ink layer by using spraying process.
  • 专利号:   PL400739-A1, PL224415-B1
  • 发明人:   WROBLEWSKI G, JANCZAK D, JAKUBOWSKA M, SLOMA M, MLOZNIAK A
  • 专利权人:   POLITECHNIKA WARSZAWSKA
  • 国际专利分类:   B82Y030/00, B82Y040/00, C01B031/04, C08J003/09
  • 专利详细信息:   PL400739-A1 17 Mar 2014 C01B-031/04 201451 Pages: 1
  • 申请详细信息:   PL400739-A1 PL400739 11 Sep 2012
  • 优先权号:   PL400739

▎ 摘  要

NOVELTY - A graphene layer producing method involves applying 0.25-5 wt.% graphene ink and 95-99.75 wt.% solvent that is butyl carbitol acetate to a substrate, and curing graphene ink layer at 100-160 degrees C, followed by applying 1-10 wt.% graphene filler comprising polymethyl polymethyl methacrylate or butyl, 90-99 wt.% butyl carbitol acetate to the ink layer by using spraying process. The layer is hardened at 100-160 degrees C, and controlling thickness of first layer to be less than 1000 nm. USE - Method for producing graphene layer on substrate.